Dammel, Ralph R.: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Spectroscopic characterization of molecular interactions between DNQ-PACs and phenolic resins using selectively nitrogen-15 labeled DNQs

Borzo, Marie, Rafalko, Joseph J., Joe, Monica, Dammel, Ralph R., Rahman, M. D., Ziliox, Martine A., Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 281 KB

english, 1995

2

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Evaluation of novel fluorinated resist matrices for 157-nm lithography

Houlihan, Francis M., Romano, Andrew R., Rentkiewicz, David, Sakamuri, Raj, Dammel, Ralph R., Conley, Will, Rich, Georgia K., Miller, Daniel, Rhodes, Larry F., McDaniels, Joseph M., Chang, Chun, Fedyn

Year:

2003

Language:

english

File:

PDF, 347 KB

english, 2003

3

Photoresists for microlithography, or the Red Queen’s race

Dammel, Ralph R.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2002

Language:

english

File:

PDF, 1.14 MB

english, 2002

4

The Photopolymer Science and Technology Award

Dammel, Ralph R.

Journal:

Journal of Photopolymer Science and Technology

Year:

2011

Language:

english

File:

PDF, 53 KB

english, 2011

5

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Baking study of fluorinated 157-nm resist

Houlihan, Francis M., Sakamuri, Raj, Romano, Andrew R., Dammel, Ralph R., Conley, Will, Rich, Georgia K., Miller, Daniel, Rhodes, Larry F., McDaniels, Joseph M., Chang, Chun, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 526 KB

english, 2003

6

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Lithographic process for high-resolution metal lift-off

Redd, Randy, Spak, Mark A., Sagan, John P., Lehar, Octavia P., Dammel, Ralph R., Conley, Will

Year:

1999

Language:

english

File:

PDF, 3.41 MB

english, 1999

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Negative photo-imageable spin-on dielectrics: report on progress, challenges, and opportunities

Zhang, Ruzhi M., Allen, Robert D., Somervell, Mark H., Lee, Chien-Hsien S., Wolfer, Elizabeth, Nagahara, Tatsuro, Neisser, Mark, Dammel, Ralph R.

Year:

2011

Language:

english

File:

PDF, 944 KB

english, 2011

8

A Percolation View of Novolak Dissolution. 3. Dissolution Inhibition

Shih, Hsiao-Yi, Yeh, Tung-Feng, Reiser, Arnost, Dammel, Ralph R., Merrem, Hans J., Pawlowski, Gerhard

Journal:

Year:

1994

Language:

english

File:

PDF, 803 KB

english, 1994

9

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Novel diamantane polymer platform for enhanced etch resistance

Padmanaban, Munirathna, Lin, Qinghuang, Chakrapani, Srinivasan, Lin, Guanyang, Kudo, Takanori, Parthasarathy, Deepa, Rahman, Dalil, Anyadiegwu, Clement, Antonio, Charito, Dammel, Ralph R., Liu, Shengg

Year:

2007

Language:

english

File:

PDF, 936 KB

english, 2007

10

193 nm Immersion Lithography-Taking the Plunge

Dammel, Ralph, Houlihan, Frank M., Sakamuri, Raj, Rentkiewicz, David, Romano, Andrew

Journal:

Journal of Photopolymer Science and Technology

Year:

2004

File:

PDF, 1.46 MB

2004

11

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Bottom antireflective coatings for ArF, KrF, and i-line applications: a comparison of theory, design, and lithographic aspects

Padmanaban, Munirathna, Ding, Shuji, Ficner, Stanley A., Kang, Wen-Bing, Khanna, Dinesh N., Dammel, Ralph R., Conley, Will

Year:

1999

Language:

english

File:

PDF, 4.29 MB

english, 1999

12

Substituted polyhydroxystyrenes as matrix resins for chemically amplified deep UV resist materials

Georg Pawlowski, Ralph Dammel, Charlotte Eckes, Charlet R. Lindley, Winfried Meier, Klaus-Jürgen Przybilla, Horst Röschert, Walter Spiess

Journal:

Microelectronic Engineering

Year:

1991

Language:

english

File:

PDF, 344 KB

english, 1991

13

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Recent advances in fluorinated resists for application at 157 nm

Houlihan, Francis M., Sturtevant, John L., Sakamuri, Raj, Romano, Andrew, Rentkiewicz, David, Dammel, Ralph R., Conley, Willard E., Miller, Daniel A., Sebald, Michael, Stepanenko, Nickolay, Markert, M

Year:

2004

Language:

english

File:

PDF, 1.70 MB

english, 2004

14

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Photoresist materials: a historical perspective

Willson, C. Grant, Dammel, Ralph R., Reiser, Arnost, Fuller, Gene E.

Year:

1997

Language:

english

File:

PDF, 2.18 MB

english, 1997

15

New Fluorinated Resins for 157 nm Lithography Application

Houlihan, Francis, Romano, Andrew, Rentkiewicz, David, Sakamuri, Raj, Dammel, Ralph R., Conley, Will, Rich, Georgia, Miller, Daniel, Rhodes, Larry, McDaniels, Joe, Chang, Chun

Journal:

Journal of Photopolymer Science and Technology

Year:

2003

File:

PDF, 2.11 MB

2003

16

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Effect of the rinse solution to avoid 193-nm resist line collapse: a study for modification of resist polymer and process conditions

Masuda, Seiya, Sturtevant, John L., Kobayashi, Masakazu, Kim, Woo-Kyu, Anyadiegwu, Clement, Padmanaban, Munirathna, Dammel, Ralph R., Tanaka, Keiichi, Yamada, Yoshiaki

Year:

2004

Language:

english

File:

PDF, 475 KB

english, 2004

17

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Photoresist characterization for lithography simulation: III. Development parameter measurements

Henderson, Clifford L., Tsiartas, Pavlos C., Pancholi, Sanju, Chowdhury, Sajed A., Dombrowski, Katherine D., Willson, C. Grant, Dammel, Ralph R., Tarascon-Auriol, Regine G.

Year:

1997

Language:

english

File:

PDF, 399 KB

english, 1997

18

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Some non-resist component contributions to LER and LWR in 193-nm lithography

Kudo, Takanori, Lin, Qinghuang, Chakrapani, Srinivasan, Lin, Guanyang, Anyadiegwu, Clement, Antonio, Charito, Parthasarathy, Deepa, Dammel, Ralph R., Padmanaban, Munirathna

Year:

2007

Language:

english

File:

PDF, 898 KB

english, 2007

19

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Bottom anti-reflective coating for hyper NA process: theory, application and material development

Yao, Huirong, Chen, Alek C., Lin, Burn, Cho, JoonYeon, Yin, Jian, Yen, Anthony, Mullen, Salem, Lin, Guanyang, Neisser, Mark, Dammel, Ralph

Year:

2008

Language:

english

File:

PDF, 368 KB

english, 2008

20

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Novel DNQ PACs for high-resolution i-line lithography

Brunsvold, William R., Eib, Nicholas K., Lyons, Christopher F., Miura, Steve S., Plat, Marina V., Dammel, Ralph R., Evans, O. B., Rahman, M. D., Khanna, Dinesh N., Jain, Sangya, Lu, Ping-Hung, Ficner,

Year:

1992

Language:

english

File:

PDF, 974 KB

english, 1992

21

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Solvent content of thick photoresist films

Lehar, Octavia P., Sagan, John P., Zhang, Lizhong, Dammel, Ralph R., Houlihan, Francis M.

Year:

2000

Language:

english

File:

PDF, 755 KB

english, 2000

22

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - PEB sensitivity studies of ArF resists: II. Polymer and solvent effects

Hong, Chi-Sun, Sturtevant, John L., Lee, Sang-Ho, Kim, Woo-Kyu, Kudo, Takanori, Timko, Allen, Mckenzie, Douglas, Anyadiegwu, Clement, Rahman, Dalil M., Lin, Guanyang, Dammel, Ralph R., Padmanaban, Mun

Year:

2004

Language:

english

File:

PDF, 89 KB

english, 2004

23

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Modeling parameter extraction for DNQ-novolak thick film resists

Henderson, Clifford L., Scheer, Steven A., Tsiartas, Pavlos C., Rathsack, Benjamen M., Sagan, John P., Dammel, Ralph R., Erdmann, Andreas, Willson, C. Grant

Year:

1998

Language:

english

File:

PDF, 2.14 MB

english, 1998

24

Materials and Resists for 193 and 157nm Applications.

Padmanaban, Munirathna, Alemy, Eric, Bae, Jun-Bom, Kim, Woo-Kyu, Kudo, Takanori, Masuda, Seiya, Rahman, Dalil, Sakamuri, Raj, Dammel, Ralph, Jung, Jae-Chang, Lee, Sung-Koo, Shin, Ki-Soo

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 4.73 MB

english, 2001

25

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Resist component leaching in 193-nm immersion lithography

Dammel, Ralph R., Sturtevant, John L., Pawlowski, Georg, Romano, Andrew, Houlihan, Frank M., Kim, Woo-Kyu, Sakamuri, Raj, Abdallah, David

Year:

2005

Language:

english

File:

PDF, 187 KB

english, 2005

26

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Molecular bases for the interaction between novolaks and diazonaphthoquinone photoactive compounds

Borzo, Marie, Rafalko, Joseph J., Dammel, Ralph R., Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 258 KB

english, 1994

27

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Non-chemically amplified 248-nm resist materials

Willson, C. Grant, Yueh, Wang, Leeson, Michael J., Steinhaeusler, Thomas, McAdams, Christopher L., Dammel, Ralph R., Sounik, James R., Aslam, M., Vicari, Richard, Sheehan, Michael T., Tarascon-Auriol,

Year:

1997

Language:

english

File:

PDF, 704 KB

english, 1997

28

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Photoresist characterization for lithography simulation: II. Exposure parameter measurements

Henderson, Clifford L., Pancholi, Sanju, Chowdhury, Sajed A., Willson, C. Grant, Dammel, Ralph R., Tarascon-Auriol, Regine G.

Year:

1997

Language:

english

File:

PDF, 417 KB

english, 1997

29

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Understanding the photoresist surface-liquid interface for ArF immersion lithography

Conley, Will, Sturtevant, John L., LeSuer, Robert J., Fan, Frank F., Bard, Allen J., Taylor, Chris, Tsiartas, Pavlos, Willson, Grant, Romano, Andrew, Dammel, Ralph

Year:

2005

Language:

english

File:

PDF, 232 KB

english, 2005

30

Gas-phase reactions. 36. Pyrolysis of vinyl azide

Bock, Hans, Dammel, Ralph, Aygen, Sitki

Journal:

Journal of the American Chemical Society

Year:

1983

Language:

english

File:

PDF, 1.13 MB

english, 1983

31

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Highly sensitive x-ray and electron-beam resists using chemical amplification

Dammel, Ralph R., Lindley, Charlet R., Pawlowski, Georg, Scheunemann, Ude, Theis, Juergen, Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 876 KB

english, 1990

32

Gas-phase reactions. 55. Thioxopropadienone (O:C:C:C:S): synthesis and photoelectron spectrum

Bock, Hans., Dammel, Ralph., Jaculi, Dieter.

Journal:

Journal of the American Chemical Society

Year:

1986

Language:

english

File:

PDF, 405 KB

english, 1986

33

A percolation view of novolak dissolution. 2. The statistics of a three-dimensional cubic percolation field and a generalized scaling law

Yeh, Tung Feng, Reiser, Arnost, Dammel, Ralph R., Pawlowski, Gerhard, Roeschert, Horst

Journal:

Year:

1993

Language:

english

File:

PDF, 777 KB

english, 1993

34

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Host-guest effects in the interaction of developers with phenolic resins

Dammel, Ralph R., Khadim, Mohammad A., Hinsberg, William D.

Year:

1993

Language:

english

File:

PDF, 425 KB

english, 1993

35

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Application of photodecomposable base concept to 193-nm resists

Padmanaban, Munirathna, Bae, Jun-Bom, Cook, Michelle M., Kim, Woo-Kyu, Klauck-Jacobs, Axel, Kudo, Takanori, Rahman, M. D., Dammel, Ralph R., Byers, Jeff D., Houlihan, Francis M.

Year:

2000

Language:

english

File:

PDF, 3.58 MB

english, 2000

36

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - CD changes of 193-nm resists during SEM measurement

Kudo, Takanori, Bae, Jun-Bom, Dammel, Ralph R., Kim, Woo-Kyu, McKenzie, Douglas S., Rahman, M. D., Padmanaban, Munirathna, Ng, Waiman, Houlihan, Francis M.

Year:

2001

Language:

english

File:

PDF, 652 KB

english, 2001

37

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Lithographic performance of isomeric hydroxystyrene polymers

Dammel, Ralph R., Rahman, M. D., Lu, Ping-Hung, Canize, Anthony, Elango, Varadaraj, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 1.08 MB

english, 1994

38

Etch Properties of 193nm Resists: Issues and Approaches.

Padmanaban, Munirathna, Alemy, Eric, Dammel, Ralph, Kim, Woo-Kyu, Kudo, Takanori, Lee, SangHo, Rahman, Dalil, Chen, Wan-Lin, Sadjadi, Reza M., Livesay, William, Ross, Matthew

Journal:

Journal of Photopolymer Science and Technology

Year:

2002

Language:

english

File:

PDF, 1.29 MB

english, 2002

39

Influence of ArF Resist Components and Process Conditions on the PEB Sensitivity

Padmanaban, Munirathna, Anyadiegwu, Clement, Kanda, Takashi, Kim, Woo-Kyu, Kudo, Takanori, McKenzie, Douglas, Rahman, Dalil, Dammel, Ralph, Lee, SangHo

Journal:

Journal of Photopolymer Science and Technology

Year:

2003

File:

PDF, 1.60 MB

2003

40

Dissolution Inhibitors for 157 nm Lithography: A Progress Report.

Conley, Will, Miller, Daniel, Chambers, Charles, Trinque, Brian C., Osborn, Brian, Chiba, Takashi, Zimmerman, Paul, Dammel, Ralph, Romano, Andrew, Willson, C. Grant

Journal:

Journal of Photopolymer Science and Technology

Year:

2002

Language:

english

File:

PDF, 799 KB

english, 2002

41

Sensitized Transparent Photobase Additive For 193 nm Lithography.

Padmanaban, Munirathna, Bae, Jun-Born, Cook, Michelle, Kim, Woo-Kyu, Klauck-Jacobs, Axel, Kudo, Takanori, Rahman, M. Dalil, Dammel, Ralph R, Byers, Jeffrey D.

Journal:

Journal of Photopolymer Science and Technology

Year:

2000

Language:

english

File:

PDF, 493 KB

english, 2000

42

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Advanced photoresist for high-throughput i-line stepper applications

Canize, Anthony, Spiess, Walter, Ficner, Stanley A., Lu, Ping-Hung, Dammel, Ralph R., Perez, Yvette M., Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 1.20 MB

english, 1995

43

New Developments In High-Performance Resist Materials.

Dammel, Ralph R.

Journal:

Journal of Photopolymer Science and Technology

Year:

1998

Language:

english

File:

PDF, 1.08 MB

english, 1998

44

Carborane-Based Photoacid Generators: New Superacids For 193nm and EUV Lithography

Dammel, Ralph R., Rahman, M. Dalil, McKenzie, Douglas, Rentkiewicz, David, Kudo, Takanori, Padmanaban, Murirathna, Werden, Karl van

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 1.35 MB

english, 2007

45

Gasphasen-Reaktionen, 71 PE-Spektren und Pyrolysen stickstoffreicher Kohlenstoff-Verbindungen: CN4, C2N4, C2H2N4, C4H6N4 und C5H4N4 Gasphase Reactions, 72 PE Spectra and Pyrolyses of Nitrogen-Rich Carbon Compounds: CN4, C2N4, C2H2N4, C4H6N4 and C5H4N4

Bock, Hans, Dammel, Ralph

Journal:

Zeitschrift für Naturforschung B

Year:

1990

Language:

german

File:

PDF, 11.20 MB

german, 1990

46

Optimization of 193 nm Contact Hole Resists for 100 nm Node.

Kudo, Takanori, Alemy, Eric L., Dammel, Ralph R., Kim, Woo-Kyu, Lee, Sang-Ho, Masuda, Seiya, McKenzie, Douglas, Rahman, M. Dalil, Romano, Andrew, Padmanaban, Munirathna, Chun, Jun-Sung, Jung, Jae-Chan

Journal:

Journal of Photopolymer Science and Technology

Year:

2002

Language:

english

File:

PDF, 2.03 MB

english, 2002

47

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Optimizing image transfer into AZ BARLi bottom coat for submicron i-line lithography

Caligiore, Alberto, Valtolina, Marco, Cipolli, Alberto, Monguzzi, Arialdo, Mohr, Fred, Spak, Mark A., Dammel, Ralph R.

Year:

1998

Language:

english

File:

PDF, 956 KB

english, 1998

48

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA, USA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Bleaching-induced changes in the dispersion curves of DNQ photoresists

Henderson, Clifford L., Tarascon-Auriol, Regine G., Willson, C. Grant, Dammel, Ralph R., Synowicki, Ron A.

Year:

1997

Language:

english

File:

PDF, 679 KB

english, 1997

49

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Refractive indices in thick photoresist films as a function of bake conditions and film exposure

Ficner, Stanley A., Dammel, Ralph R., Perez, Yvette M., Gardiner, Allen B., Willson, C. Grant, Tarascon-Auriol, Regine G.

Year:

1997

Language:

english

File:

PDF, 1.01 MB

english, 1997

50

Die Pyrolyse von Aziden in der Gasphase

Prof. Dr. Hans Bock, Dr. Ralph Dammel

Journal:

Angewandte Chemie

Year:

1987

Language:

german

File:

PDF, 2.09 MB

german, 1987

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